Thursday, November 18, 2010

To 22nm and Beyond!

I wish I had gone to the ARM Technology Conference. Lots of good design topics, and some long-range prognostication such as IBM Speaker Outlines Path to 22nm and Beyond. This blog post by Richard Goering of Cadence summarizes a talk by a VP of IBM's semiconductor research center. For 22nm, they main change appears to be more "lithography tricks". Richard includes a link about "double patterning".

Beyond 22nm, many things get exotic. Extreme UV (EUV) has been the next big lithography change for ages -- is it finally required for 15nm? FINFETS, Carbon Nanotubes, and Stacked Die, Oh My! We're not in Kansas any more.

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