The secret sauce in their 45 nm recipe is "HK+MG", for High-K dielectric and Metal Gate. Cool stuff, this High-K addresses the huge problem of gate leakage as the process scales down. The power reduction claims are very impressive.
One nit that's always bothered me is that we all design in CMOS, and the "M" in CMOS stands for Metal. But the gate hasn't been metal in ages! Now it is metal again and it's a novelty. What is old is now new again.